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. Author manuscript; available in PMC: 2012 Jun 11.
Published in final edited form as: Biometrics. 2011 Mar;67(1):29–38. doi: 10.1111/j.1541-0420.2010.01449.x

Table 2.

Simulation results: Examination of bootstrap standard errors (t=2, n=200)

Setting C% log ϕ 1(t) BIAS ASE ESD CP
I 23% 0.283 0.017 0.331 0.317 0.96
40% 0.022 0.344 0.337 0.96
log ϕ̂1(t) II 13% 0.778 0.004 0.309 0.320 0.94
33% 0.022 0.323 0.332 0.95
III 28% 0.778 0.017 0.321 0.326 0.95
46% 0.024 0.347 0.356 0.95
Setting C% log RR1(t) BIAS ASE ESD CP

I 23% 0.238 0.015 0.283 0.270 0.96
40% 0.019 0.293 0.286 0.96
log RR^1(t)
II 13% 0.619 0.007 0.255 0.264 0.94
33% 0.021 0.267 0.274 0.95
III 28% 0.619 0.017 0.265 0.269 0.96
46% 0.024 0.288 0.297 0.95
Setting C% Δ1(t) BIAS ASE ESD CP

I 23% −0.036 −0.002 0.087 0.087 0.95
40% −0.004 0.089 0.090 0.94
Δ̂1(t) II 13% −0.196 0.005 0.095 0.100 0.93
33% −0.002 0.096 0.099 0.93
III 28% −0.196 −0.002 0.096 0.099 0.94
46% −0.001 0.099 0.102 0.94

Setting I: η1 = 0, η2 = 0.2, η3 = 0.5, θ = 1

Setting II: η1 = 0.5, η2 = 0.2, η3 = 0.5, θ = 1

Setting III: η1 = 0.5, η2 = 0.2, η3 = 0.5, θ = 0.25