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. Author manuscript; available in PMC: 2012 Aug 22.
Published in final edited form as: Chemistry. 2011 Jul 27;17(35):9595–9598. doi: 10.1002/chem.201100768

Table 1.

In Situ Intramolecular Schmidt Reaction of Known Substrates[a]

Entry Halide Product Yield
(%)
Recovery (%)
(Azide/Halide)
graphic file with name nihms381643t1.jpg graphic file with name nihms381643t2.jpg
1 1a R = H 3a R = H 69
2 1a R = H 3a R = H 76[b]
3 1b R = CO2Et 3b R = CO2Et 68 5/6
4 1c R = Ph 3c R = Ph 5 60/15
graphic file with name nihms381643t3.jpg graphic file with name nihms381643t4.jpg
5 4a X = Cl 5 60 –/23
6 4b X = Br 5 61
graphic file with name nihms381643t5.jpg graphic file with name nihms381643t6.jpg
7 6a R = H 7a R = H 8 37/19
8 6b R = CO2Et 7b R = CO2Et 66/16
graphic file with name nihms381643t7.jpg graphic file with name nihms381643t8.jpg
9 8a R = Me 9a R = Me 25 36/14
10 8b R = CH2CO2Et 9b R = CH2CO2Et 44/7
[a]

Conditions: 1. Halide 2M in CH3CN, NBu4N3 (1.1 equiv.), 125 W MWI, 50 µL/min. 2. TFA (3 mL, excess) 50 µL/min, 40 PSI back pressure.

[b]

Second step of the sequence performed outside of the microwave cavity.