Table 2.

In Situ Intramolecular Schmidt Reaction of New Substrates^[a]

Entry	Halide		Product	Yield (%)	Recovery (%) (Azide/Halide)
1	10a	X = Cl	11	51	–/14
2	10b	X = Br	11	53	–
3	12a	X = Cl	13	77[b]	–/11
4	12b	X = Br	13	61[b]	–
5				54	–
6				83	–
7				trace	66/–
8				67	–
9				40 (23:24 = 3:1)	33/–

^[a]Conditions: 1. Substrate 2M in CH₃CN, 1.1 equiv. NBu₄N₃, 300 W MWI, 50 µL/min. 2. TFA (3 mL, excess) 50 µL/min, 40 PSI back pressure.

^[b]Reaction was performed at 125 W.