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. 2012 May 2;3:360–367. doi: 10.3762/bjnano.3.42

Figure 11.

Figure 11

Schematic depiction of the airbrush deposition process. A solution of MWCNTs in isopropyl alcohol was airbrushed onto a Si/SiO2 sample. The SiO2 steps avoid the formation of a short circuit between the top electrodes and the Si. The Si window was 5 × 5 mm2. During airbrushing, the device was mounted on a heatable holder (~200 °C) in order to allow an instantaneous evaporation of the solvent, thus avoiding the formation of droplets.