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. Author manuscript; available in PMC: 2013 Mar 1.
Published in final edited form as: Rep Prog Phys. 2012 Feb 13;75(3):036501. doi: 10.1088/0034-4885/75/3/036501

Figure 6.

Figure 6

Lithographic patterning: Option 1: If the substrate is amenable to dry etching (e.g. Si or SiO2), the pattern in the photoresist is readily transferred. Option 2: If the substrate is not amenable to dry etching like most metallic films, a lift-off process is used instead.