. Author manuscript; available in PMC: 2012 Jul 15.

Published in final edited form as: Nanoscale. 2010 Dec 7;3(2):421–428. doi: 10.1039/c0nr00720j

Table 1.

The ellipsometry, EDX quantitative analysis and contact angle results of an MPS chip and its different functionalized derivatives. (Each result is the average number from 15 spot tests.)

	Film thickness/nm	Film porosity (%)	Atomic % of metal (EDX)	Atomic % of metal (XPS)	Surface contact angle (°)
MPS	798.20 ± 8.22	55.27 ± 0.06	0	0	4.90 ± 0.24
MPS/Ga³⁺	801.97 ± 10.04	46.47 ± 0.05	Ga: 0.45 ± 0.04	Ga: 0.55	5.13 ± 0.39
MPS/Ti⁴⁺	813.01 ± 13.53	43.84 ± 0.06	Ti: 0.55 ± 0.10	Ti: 1.47	5.93 ± 0.27
MPS/Zr⁴⁺	810.11 ± 5.27	46.83 ± 0.03	Zr: 1.01 ± 0.07	Zr: 2.01	5.65 ± 0.54