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Ellipsometric thicknesses of PEMs assembled on the native oxide surface of silicon wafers. (A) Cumulative thickness of PEMs with the structure (PAH/PAA/CX/PAA)n or (PAH/PAA)5(CX/PAA)10, both assembled on the native oxide surface of silicon wafers (B) Cumulative thickness of PEMs of (CX/PAA)n deposited on a foundation of (PAH/PAA)5. Thickness of only (CX/PAA)n is plotted. Data represent the mean ± standard deviation (n≥4).
