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NO release profiles of NO releasing films with a base layer containing 20 wt% DBHD/N2O2 in a-50-50 and or e-50-50 at RT (A) and 30 wt% DBHD/N2O2 in a-50-50, e-50-50, e-75-25 or e-PLL at 37 °C (B). The NO flux was recorded on a chemiluminescence NO analyzer (NOA). The fluxes presented are the average of two films (n=2). *, P<0.05 (the fluxes of a-50-50-based NO releasing films are significantly different from the fluxes of e-50-50-based films).
