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Arrays of circular mask features with progressively smaller edge-to-edge spacings of (a) 30 µm, (b) 20 µm, and (c) 10 µm following 10 min solvent exposure. The flat circular valleys passivated by UV/O3 exposure expand during orogenic growth, leading to the formation of discrete posts for the case of 10 µm spacing. Approximate sizes of the initial UV/O3 mask regions are shown in each image (dashed circles).
