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. 2012 Oct 8;7(10):e45379. doi: 10.1371/journal.pone.0045379

Figure 5. Dependence of sensitivity on orientation and Debye length and Inline graphic dependence on Inline graphic.

Figure 5

A: The data series corresponds to either the Asp or Lys residues being close to the nanowire surface in Figs. 4A and C. The black data series corresponds to both Asp and Lys residues being equally distant from the surface, as in Fig.4B. B: Dependence of Inline graphic on Inline graphic, Eq. 2, for different values of Inline graphic and Inline graphic nm. For Inline graphic nm, the function vanishes for Inline graphic nm.