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. 2012 Oct 18;2:754. doi: 10.1038/srep00754

Table 2. Field-effect performance characteristics of OTFTs of different device configurations and dimensions with channel semiconductor 1 as measured under ambient conditions.

OTFT Configuration Substrate Deposition Process Dielectric (nm)/SiO2-modifying agent W/L (μm/μm) μ (cm2V−1s−1) Ion/Ioff (log10) VT (V) S (Vdec−1)
BGTC Silicon Spin coating SiO2 (200)/OTS-8 4000/100 5.5–8.2 7.0–8.0 0–4 0.8–1.0
BGTC Silicon Spin coating SiO2 (200)/OTS-8 4000/125 5.5–9.0 7.0–8.0 0–4 0.8–1.0
BGBC Silicon Spin coating SiO2 (300)/OTS-18 1400/30 3.5–8.0 6.0–8.0 –5–3 0.8–1.6
BGBC Silicon Spin coating SiO2 (300)/OTS18 1400/40 5.4–10.5 6.0–8.5 –6–4 0.7–1.4
BGBC Silicon Spin coating SiO2 (300)/OTS-18 1400/50 5.2–10.5 6.0–8.5 –6–3 0.7–1.4
BGTC Silicon Blade coating SiO2 (200)/OTS-8 4000/125 3.5–5.3 6.0–7.0 –1–1 1.0–1.2
BGTC Silicon Inkjet printing SiO2 (200)/OTS-8 1400/125 1.5–3.5 5.5–6.0 –1–1 1.0–1.2
BGBC PET Spin coating PAN/PMSQ (800/50)/OTS-18 7000/70 1.7–5.3 5.0–7.5 –6–2 1.3–2.0

BGTC: bottom-gate, top-contact; BGBC: bottom-gate, bottom-contact.

OTS-8: surface modification with octytrichlorosilane and OTS-18: surface modification with octadecyltrichlorosilane.