Table 2.
Development progress of CMOS polarization imager.
| Project Author, Year | Polarizer on Chip (Pitch)–Metal Type | Pixel Size (μm2) | Pixel Number | Chip Size (μm2) | Extinction Ratio (ER) | SNR (dB) | Micropolarizer Type and Direction | Fabrication Process |
|---|---|---|---|---|---|---|---|---|
| Tokuda, 2009 [75] | 1,200 μm | 20 × 20 | 30 × 30 | 1,880 × 1,880 | 2.03 | 0.35 mm 2 poly 4 metal standard CMOS | ||
| Zhao, 2009 [73] | 10 μm -polymer | 100 | four directions of polarization; 0°, 90°, 45° and −45° | Spin coating and UV photo-lithography | ||||
| Gruev, 2010 [76] | 140 nm-Al | 1,000 × 1,000 | 58 | 45 | micropolarizers with four different orientations offset by 45° | |||
| Perkin, 2010 [78] | 130 nm-Al | 1,000 × 1,000 | 58 | 45 | four polarizer filter array (0°, 45°, 90°, 135°) | |||
| Perkin, 2010 [78] | 130 nm-Al | 1,000 × 1000 | 58 | 45 | two polarizer filter array (0°, 45°) | |||
| Gruev, 2010 [77] | polymer | 18 × 18 | 100 × 100 | 13 | 43.3 | Dual tier polymer film with two different orientation offset by 45° | 0.5 μm 2 poly 3 metal UMC CIS | |
| Sarkar, 2010 [79,80] | 480 nm | 25 × 25 | 128 × 128 | 4,000 × 5,000 | 22 | 33 | Combination of two types of micro-polarizer (first type: 2 direction of polarization; 0° and 90°; second: 3 direction of polarization; 0°, 45° and 90°) | 0.18 μm 1 poly 3 metals UMC CIS |