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Scanning electron micrographs of accessible etched morphologies after a single etching step of identical polycrystalline ZnO:Al material: a) waterless etching in a 0.5 w/w % solution of HCl in 1,4-dioxane, b) etching in a 0.5 w/w % aqueous solution of HCl (as an example for protic acids with a high degree of dissociation), c) etching in a 1 w/w % aqueous solution of HF, d) anodic electrochemical etching in 0.1 m KCl at +2 V vs. Ag|AgCl|3 m KCl.
