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SEM cross-sections of 4 μm wide, 5.5 μm deep trenches deposited with a 5 μm glass layer shown either as-deposited (no reflow) or underwent reflow at 1000 °C for the stated anneal time. The spacing between the adjacent trenches: (a) 10 μm and (b) 5 μm. Scale bars: 5 μm. Simulation plots (c) and (d) correspond to the fabricated profiles in (a) and (b), respectively, and indicate simulated shape profile and flow velocity distribution within the glass layer.
