Figure 2.

Reversible mechano-electrochemical writing of Cu nanostructures. (a) WRITE: In situ AFM image of an initial Cu island structure (“6”). The “6”-structure was deposited by tip-induced mechano-electrochemical writing on a gold substrate, applying a deposition potential of −60 mV versus Cu/Cu²⁺ for 5 s. (b) DELETE: In situ AFM image of the gold substrate after deletion. For deletion a potential of +0.2 mV versus Cu/Cu²⁺ was applied for 180 s. (c) RE-WRITE: In situ AFM image of a further Cu island structure (“9”). The “9”-structure was deposited on the same area where previously the “6”-structure had been written and deleted. For orientation see the point-shaped defect in the upper-left corner of the images, marked by an arrow. Typical height of the islands: 15 nm. Scan size: 1.6 µm × 1.6 µm.