Table 2.
Surface properties of the substrates used in this study: root mean square (r.m.s.) roughness, advancing (adv.) and receding (rec.) water contact angle, surface energy γ and Lifshitz–van der Waals γLW and Lewis acid–base γAB components obtained from contact angles of three different liquids [39]. The number in brackets gives the error bar of the last digit.
| r.m.s. (nm) | γ (mJ m−2) | γLW (mJ m−2) | γAB (mJ m−2) |
 (°) |
 (°) |
|
|---|---|---|---|---|---|---|
| OTS T | 0.19(3) | 24(1) | 24(1) | 0 | 111(3) | 103(4) |
| OTS N | 0.17(0) | 24(1) | 24(1) | 0 | 111(2) | 103(2) |
| SiO2 T | 0.13(3) | 63(1) | 43(1) | 20(1) | 5(2) | complete wetting |
| SiO2 N | 0.09(2) | 64(1) | 43(1) | 21(1) | 7(2) | complete wetting |