Table 1.

Element content of the oxide nanofilms before and after annealing at 450°C and 550°C

Tested area	Oxide nanofilm condition	Element (at.%)
		Ti	Al	V	O
α-Phase region	After anodization	61.45	6.52	2.68	29.35
	Annealed at 450°C	26.90	3.39	0.87	68.83
	Annealed at 550°C	23.09	2.96	0.61	73.34
β-Phase region	After anodization	65.35	6.94	3.88	23.83
	Annealed at 450°C	44.40	4.79	2.15	48.66
	Annealed at 550°C	32.76	3.60	1.50	62.15