Figure 10.
(a) Unequal deposition of copper(II) oxide microparticles on filter membranes after a 60 min exposure. (b) Inlet-adapter with an integrated jet nozzle to avoid unequal particle deposition within the CULTEX RFS module. (c) Uniform deposition of copper(II) oxide on filter membranes after a 60 min exposure with a jet nozzle.