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(a) 3D cross-section illustration of the core-shell Si nanowire (NW) device structure. The active device region is the radial n-i-p thin film Si shell surrounding the nanowire. Light is incident through the aluminum doped ZnO (ZnO∶Al) transparent conductive oxide top contact. The intrinsic (i) region is amorphous Si (a-Si) or nanocrystalline Si (nc-Si). (b) 3D cross-section illustration of a planar control cell.
