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Measured hemispherical reflectance spectra of Si nanostructures and estimated average height and calculated SWRs. (a) Measured hemispherical reflectance spectra of the corresponding Si nanostructures fabricated using different etchant concentrations from 33% to 14% in an aqueous solution. (b) Estimated average height and calculated SWRs as a function of the concentration of etchant. The insets show 45° tilted-view SEM images for etchant concentrations of 20%, 25%, and 33%.
