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. 2013 Apr 8;110(18):E1653–E1660. doi: 10.1073/pnas.1215353110

Fig. 1.

Fig. 1.

(A and B) Schematics of the microdevice. When the precursor passes through the micropost array, it undergoes high strain rates of Inline graphic and total strain of Inline graphic, leading to FISP formation. (C) Snapshot shows the “finger-like” FISP formation. (D) High-resolution SEM image of FISP50 at a magnification of 100,000× under high voltage of 3.00 kV.