Table 1.
Parameter | Conditions |
---|---|
Vacuum | 3×10 − 6 torr |
Deposition rate of Ti | 0.08 – 0.12 nm/s |
Thickness of Ti | 100 nm |
Deposition rate of Au | 0.08 – 0.12 nm/s |
Thickness of Au | 400 nm |
E-beam focusing size | 3 mm |
E-beam power | 7 kV |
Parameter | Conditions |
---|---|
Vacuum | 3×10 − 6 torr |
Deposition rate of Ti | 0.08 – 0.12 nm/s |
Thickness of Ti | 100 nm |
Deposition rate of Au | 0.08 – 0.12 nm/s |
Thickness of Au | 400 nm |
E-beam focusing size | 3 mm |
E-beam power | 7 kV |