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Photopolymerization profiles of EPOX upon Xe–Hg lamp irradiation (λ > 340 nm) under air for different photoinitiating systems: (A) (a) Iod (2% w/w); (b) Py_3/Iod (1%/2% w/w); (c) Py_1/Iod (1%/2% w/w); (B) (a) TH (2% w/w); (b) Py_3/TH (0.2%/2% w/w); (c) Py_8/TH (0.2%/2% w/w); (d) Py_9/TH (0.2%/2% w/w); (e) Py_10/TH (0.2%/2% w/w); (f) Py_11/TH (0.2%/2% w/w).
