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. 2008 Jul 29;8(7):4466–4486. doi: 10.3390/s8074466

Figure 4.

Figure 4.

Sketch of the UHV chamber for in situ stress and magnetic studies. The sample can be lowered with the manipulator from the upper preparation level (LEED, MEED, AES) to the lower magnet level. At both levels optical deflection measurements as shown in Fig. 3 are mounted for stress during growth and magnetization-induced stress measurements, respectively.