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. 2013 Jul 3;3(7):516–526. doi: 10.7150/thno.4119

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© Ivyspring International Publisher. This is an open-access article distributed under the terms of the Creative Commons License (http://creativecommons.org/licenses/by-nc-nd/3.0/). Reproduction is permitted for personal, noncommercial use, provided that the article is in whole, unmodified, and properly cited.

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Fig 5 — uPAR counteracts substrate topography-induced VSMC morphological changes. A. Efficiency of uPAR expression downregulation was assessed by TaqMan analysis. GUSB expression was used for normalization. B. VSMC nucleofected with control siRNA or uPARsi RNA and cultivated on 30 µm groove substrates were fixed and stained for SMA (Alexa 488) and DraQ5 as nuclear stain. Arrows in the left panel indicate cells with clearly developed leading edge. C. More elongated morphology of uPARsi VSMC was characterized by calculating cells circularity using ImageJ software. D. Relative expression of SMA and calponin in SiCo and uPARsi VSMC cultivated on 30 µm groove substrates was assessed by TaqMan analysis. GUSB expression was used for normalization. E. VSMC cultivated on non-structured E-Shell and 30 µm groove substrate were fixed and stained for uPAR (Alexa 594) and FAK (Alexa 488) to reveal focal adhesions. F. The panels show indicated area of the right upper panel. The right panel shows image intensity profiles obtained using ImageJ software. The position of the image used for image intencity profile is shown by arrows.