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. Author manuscript; available in PMC: 2013 Sep 30.
Published in final edited form as: J Neurosci Methods. 2008 Oct 21;177(2):294–302. doi: 10.1016/j.jneumeth.2008.10.014

Fig. 1.

Fig. 1

Overview of microfluidic device fabrication using photolithography and replica molding. (a) The SU-8 photoepoxy is patterned with using the chrome mask by contact photolithography. (b) Unexposed SU-8 photoepoxy is removed, leaving behind the device mold. (c) PDMS is poured over the SU-8 mold to generate the “imprinted” layer. (d) After baking, the imprinted layer is peeled away from the SU-8 mold. (e) The imprinted layer of PDMS is bonded with an “unimprinted” layer to seal off the channels. Chrome mask, SU-8 photoepoxy, silicon wafer, and PDMS are indicated by the white, black, dark grey, and light grey layers, respectively. The pre-polymer to catalyst ratio is indicated within the PDMS layers.