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. Author manuscript; available in PMC: 2014 Jun 1.
Published in final edited form as: Biomed Microdevices. 2013 Jun;15(3):385–396. doi: 10.1007/s10544-012-9727-7

Fig. 3.

Fig. 3

Pattern layout on the photomask for the pattern with varying inter-space (10, 20 and 40 µm) dimensions between posts. Dark regions correspond to chrome (opaque) regions on the photomask, and light regions correspond to regions transparent to UV exposure.