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. Author manuscript; available in PMC: 2014 Jul 1.
Published in final edited form as: Magn Reson Imaging. 2013 Mar 29;31(6):10.1016/j.mri.2013.01.013. doi: 10.1016/j.mri.2013.01.013

Fig. 9.

Fig. 9

Processing steps to generate segmented pons masks for distortion analysis: OVS-reduced DTI, cropped full DTI, and T1-weighted images (A–C), pons manually segmented from panels A and B (D–F), and threshold pons mask demonstrating its shape (constant value 1 within borders) (G–I).