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Nanoscale Research Letters logoLink to Nanoscale Research Letters
. 2013 Oct 22;8(1):419. doi: 10.1186/1556-276X-8-419

Retraction: Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaOx interface

Amit Prakash 1,, Siddheswar Maikap 1, Hsien-Chin Chiu 1, Ta-Chang Tien 1, Chao-Sung Lai 1
PMCID: PMC3853228  PMID: 24229327

Retraction

This article is retracted.

The journal editors would like to apologise for the early publication of the original article [1], which is being retracted as it was published prior to the completion of essential revisions.

Contributor Information

Amit Prakash, Email: amit.knp02@gmail.com.

Siddheswar Maikap, Email: sidhu@mail.cgu.edu.tw.

Hsien-Chin Chiu, Email: hcchiu@mail.cgu.edu.tw.

Ta-Chang Tien, Email: tien@itri.org.tw.

Chao-Sung Lai, Email: cslai@mail.cgu.edu.tw.

References

  1. Prakash A, Maikap S, Chiu HC, Tien TC, Lai CS. Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaOx interface. Nanoscale Research Letters. 2013;8:288. doi: 10.1186/1556-276X-8-288. [DOI] [PMC free article] [PubMed] [Google Scholar]

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