Table I.

XPS determined elemental compositions of bare, ClSi-modified, and pNaSS-grafted Ti and Si substrates. AFM RMS roughness values for each sample are also listed. All composition and roughness values are reported as the avg ± stdev of three spots on two samples.

XPS atomic %
	Evaporated Ti			Diced Si
	Bare substrate	ClSi iodified	pNaSS grafted	Bare substrate	ClSi modified	pNaSS grafted
${\mathrm{O}}_{1\mathrm{s}}$	54.2 ± 0.5	37.6 ± 1.0	22.5 ± 1.2	34.8 ± 0.7	25.5 ± 0.6	22.6 ± 0.6
${\mathrm{C}}_{1\mathrm{s}}$	23.3 ± 0.4	44.3 ± 2.1	63.2 ± 1.2	12.6 ± 0.9	41.8 ± 2.3	64.0 ± 0.6
${\text{Ti}}_{2\mathrm{p}}$	22.4 ± 0.2	13.2 ± 0.5	0.3 ± 0.2	-	-	-
${\text{Si}}_{2\mathrm{p}}$	-	3.3 ± 1.0	1.3 ± 1.4	52.6 ± 1.3	29.5 ± 1.7	2.0 ± 0.6
${\text{Br}}_{3\mathrm{d}}$	-	1.5 ± 0.2	-	-	3.2 ± 1.3	-
${\mathrm{S}}_{2\mathrm{p}}$	-	-	6.3 ± 0.5	-	-	5.8 ± 0.3
${\text{Na}}_{1\mathrm{s}}$	-	-	6.4 ± 0.4	-	-	5.6 ± 0.7
AFM RMS roughness	2.2 ± 0.2	2.1 ± 0.3	2.4 ± 0.7	0.2 ± 0.01	0.8 ± 0.2	1.9 ± 0.9