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. 2013 Nov 8;13(11):15324–15347. doi: 10.3390/s131115324

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© 2013 by the authors; licensee MDPI, Basel, Switzerland.

This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/).

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Figure 16. — Electrical resistivity of In₂O₃ and ITO films prepared in Ar and Ar/N₂ plasmas.