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. Author manuscript; available in PMC: 2014 Jun 25.
Published in final edited form as: ACS Nano. 2013 May 17;7(6):10.1021/nn401011n. doi: 10.1021/nn401011n

Figure 2.

Figure 2

LbL film growth and siRNA incorporation. (A) Plot of film thickness versus the number of film architecture repeats for all four film architectures deposited on flat silicon substrates. The data points represent average measurements taken by both profilometry and elipsometry, error bars represent 95% confidence interval. (B) Plot of total siRNA loading per film area of all four tested films measured using Oligreen dsDNA assay of fully degraded samples. (C) Loading density of siRNA with the formed films (μg/mm3) and the efficiency of siRNA incorporation for film architectures tested at 25 architecture repeats.