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. 2014 Feb 6;4(1):20130047. doi: 10.1098/rsfs.2013.0047

Figure 1.

Figure 1.

Substrates with surface GRs. (a) Schematic representation of the fabrication process: the silicon moulds are fabricated by electron beam lithography (EBL) and reactive-ion etching (RIE); thermal nanoimprint lithography is exploited to transfer the pattern from the moulds to thermoplastic materials as the copolymer 2-norbornene ethylene (COC). (b,c) Scanning electron microscopy images of COC GRs: T2 (b) and T4 (c); scale bars, 1 μm. (Online version in colour.)