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Fabrication sequence of the 3-electrode non-enzymatic microneedle-based glucose sensor (a) deep reactive ion etching of silicon to form rectangular pillar array; (b) wet etching of the rectangular pillar Si array to make sharp Si needle array; (c) iron deposition through a shaodw mask and MWCNT growth followed by Pt nano-particles electroplating; and (d) Ag deposition through a shadow mask and formation of Ag/AgCl reference electrode.
