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. 2014 Jan 8;9(1):9. doi: 10.1186/1556-276X-9-9

Figure 1.

Figure 1

Schematics of the fabrication process for the Si nanostructures. (a, b) The Si sheets were etched using hydrogen and argon mixture gases under 1 × 10−2 Torr at different high temperatures. (c) The Si-based polymer (PDMS) deposition on the Si nanostructures for enhancing the AR property.