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. 2014 Jan 23;4:3835. doi: 10.1038/srep03835

Figure 1.

Figure 1

(a) Schematics of the junction structure and measuring configuration. (b) Hysteresis loops of the glass/Cr(2 nm)/Ag(30 nm)/Co(10 nm)/CoO-ZnO(2 nm)/Ag(60 nm) film (marked as Co/ZnO) and the glass/Cr(2 nm)/Ag(30 nm)/Co(10 nm)/Ag(60 nm) reference film (marked as Co/Ag) measured by SQUID at 5 K and 300 K. The Hysteresis loops at 5 K were measured after cooling down from 300 K with 30000 Oe magnetic field. (c) The XPS of Co element, which was measured when the glass/Cr(2 nm)/Ag(30 nm)/Co(10 nm)/CoO-ZnO(2 nm) film was etched gradually from the ZnO layer through CoO to Co layer. (d) The atomic percent of Co, O, Zn, and Ag elements measured by XPS, which gradually varies with etching times. In the CoO-ZnO composite layers, Ag is ignorable within the errors of experiments.