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. 2014 Feb;80(4):1340–1348. doi: 10.1128/AEM.03330-13

FIG 4.

FIG 4

H111 is more resistant to organic peroxide-induced oxidative stress than its pC3-null derivative. Discs soaked in 1% tert-butyl-hydroperoxide were placed on Mueller-Hinton plates inoculated with either H111 or H111Δc3 and incubated for 18 h. A representative disc is shown for each bacterial strain. The discs on the H111Δc3 lawns are surrounded by a clear halo. These are absent from the H111 lawns, indicating the resistance of this strain.