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. 2008 Jun 9;8(6):3848–3872. doi: 10.3390/s8063848

Figure 11.

Figure 11.

Scanning Electron Microscopy images of devices after stripping the silicon oxide mask and abundant rinsing with MilliQ water (a-b). Residue is present and accumulates at the bottom of the taper and on the plateau. The same devices after cleaning with 25% HF in ethanol and storage in 50% ethanol (c-d).