Skip to main content
. 2008 Jun 9;8(6):3848–3872. doi: 10.3390/s8063848

Figure 2.

Figure 2.

Scanning Electron Microscopy images of the structures fabricated with a 600 μm (a,b) and a 700 μm (c,d) square mask after re-etching in the same bath at 40 °C with addition of IPA to saturation. The presence of an agglomeration of hillocks at the bottom of the 600 μm mask opening as well as the circular pits at the bottom of the 700 μm opening are still evident.