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. 2014 Feb 10;9:841–852. doi: 10.2147/IJN.S56062

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© 2014 Wang et al. This work is published by Dove Medical Press Limited, and licensed under Creative Commons Attribution – Non Commercial (unported, v3.0) License

The full terms of the License are available at http://creativecommons.org/licenses/by-nc/3.0/. Non-commercial uses of the work are permitted without any further permission from Dove Medical Press Limited, provided the work is properly attributed.

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Chemical structures of the two types of POSS and the resin monomers.

Abbreviations: Bis-GMA, bisphenol A glycerolate dimethacrylate; MA-POSS, methacryl polyhedral oligomeric silsesquioxanes; MI-POSS, methacryl isobutyl polyhedral oligomeric silsesquioxanes; POSS, polyhedral oligomeric silsesquioxanes; TEGDMA, tri(ethylene glycol) dimethacrylate.