FIGURE 8.

Expression of MMPs following plating on Matrigel or scratch wounding. A, relative mRNA expression of MMPs in Swan 71 trophoblast cells during quiescent (standard cell culture, indicated by the dashed line) conditions or following plating on Matrigel for 6 h. B, Swan 71 trophoblast cells were grown to confluence and then subjected to multiple scratch wounds. RNA was extracted at 6 h following wounding. Monolayers that were not subjected to wounding were used as controls (unscratched, indicated by the dashed line). Only those MMPs that were detected at above threshold levels are included. Values significantly increased (p < 0.05) from controls are denoted with an asterisk (*). MMP1, MMP3, and MMP10 are shown in black bars because they were significantly increased in both A and B. Error bars represent S.E.