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. 2014 Mar 4;4:4268. doi: 10.1038/srep04268

Figure 1.

Figure 1

(a) Schematic illustration, (b) cross-sectional SEM image, (c) device flexibility, (d) device transparency and (e) patterned ITO electrodes on the substrate of the fabricated UV photoconductor (L = 50, 100, 150, and 200 μm, W = 5000 μm).