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An illustration of the molding procedure of 4% agar microchannels. (a) Spin coated SU-8 photoresist (thickness: 500 μm) is exposed to UV light through a photomask. (b) Development produces a SU-8 mold. (c) Four percent molten agar is pour over the SU-8 mold and cured at room temperature for 10-15 minutes. (d) The solidified 4% agar microchip is then peeled off from the mold.
