Figure 6. (a) SEM Micrographs of 2 nm Ag/SiOx/Si (100)@ 800°C in air, X-TEM Micrographs of 2 nm Ag/SiOx/Si (100)(b) as deposited and annealed at @ 800 °C in air (c) Low Magnification (d) HRTEM of selected area depicts endotaxial structures.
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