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. 2014 Apr 15;10:863–876. doi: 10.3762/bjoc.10.83

Figure 10.

Figure 10

(A) Photopolymerization profile of EPOX; photoinitiating system: Ir(piq)2(tmd)/Ph2I+/NVK (1%/2%/3%); laser diode at 532 nm exposure (~100 mW/cm²); under air. (B) Conversion profile for the NVK double bond in the course of the polymerization.