Table 2.
Classification | References | Electrochemical platform | Detection medium | Technique | Analyte(s) | LOD | Linear concentration range | Analyte pretreatment conditions |
---|---|---|---|---|---|---|---|---|
POLAROGRAPHY | ||||||||
Online monitoring river | DPASV | Total Zn | 2.91 nM | 12.4–23.2 nM | 30 s at −1.3V | |||
Total Pb | 0.03 nM | 1.7–3.2 nM | 60 s at −0.7V | |||||
Magnier et al., 2011 | HMDE | DPCSV | Total Cu | 0.6 nM | 4.9–7.6 nM | 30 s at −1.1 V followed by an adsorption step at −0.25 V during 15 s | ||
Riso et al., 2006 | HgFE | Water samples (treated) | SCP | Fe(III) | 1.5 nM | NC | 6 cycles of: 0.04 V (9 s) and −0.4V (1 s) | |
Tanguy et al., 2010 | HgFE | Seawater samples (treated) | SCP | Sb(III) | 70 pM | depending on sample | 300 s at −0.45 V | |
Sladkov et al., 2003 | HgFE | 0.1 M HNO3 | SWCSV | Se(IV) | 0.8 nM | 1–1000 nM | 300 s at −0.45 V | |
Riso et al., 1997 | HgFE | Seawater | SCP | Cu | 0.7 nM | NC | 15 min at −1.1 V | |
Pb | 14 pM | |||||||
Cd | 9 pM | |||||||
Cugnet et al., 2009 | SPμEAs | 0.2 M acetate (pH = 4.5) | SWASV | Cd(II) | 11.6 nM | 11.6–89 nM | 300 s at −1 V | |
Parat et al., 2011a | HMDE | 0.1 M KNO3 | AGNES-SCP | Zn2+ | 4 nM | at least 25–100 nM | 1400 s total with complex procedure | |
Cd2+ | 2.9 nM | |||||||
Pb2+ | 4.1 nM | |||||||
Parat et al., 2007 | Membrane and Hg film SPE | 0.2 M acetate (pH = 4–7) | SWASV | Cd(II) | 2 nM | 5–100 nM | 60 s at −1 V | |
Munteanu et al., 2009 | Mercury monolayer carbon fiber electrode | NC | SWASV | Pb(II) | 80 fM | 1–10 pM | 1 s at −1.2 V | |
Parat et al., 2011b | Hg film SPE | 0.2 M acetate (pH = 4.6) | SSCP | Cd | 2.2 nM | NC | 60 s at −1 V | |
Zaouak et al., 2010a | Hg film SPE | 0.2 M acetate (pH = 4.5) | SWASV | Cd | 1.78 nM | 1.78–356 nM | 60 s at −1 V | |
Bi FILMS | ||||||||
Guo et al., 2005 | GC/BiFE | Milk vetch in 0.2 M KSCN | ASV | Zn(II) | 9.6 nM | 500–3000 nM | 120 s at −1.4 V | |
Legeai et al., 2005 | GC/BiFE | 0.125 M HNO3 + 0.04 M H2NSO3H | DPASV | Cd(II) | ~10 nM | 20–1000 nM | 1200 s at −0.95 V | |
Legeai et al., 2006 | Cu/Bi film electrode | 0.01 M ammonia buffer (pH = 9) | SWASV | Ni2+ | NC | 10–1000 nM | 900 s at −0.7 V | |
Legeai and Vittori, 2006 | Cu/Nafion/Bi electrode | 0.01 M NaCl + 0.001 M NaHCO3 | DPASV | Cd2+ | 6.05 nM | 17.8–107 nM | 300 s at −0.95V | |
Pb2+ | 3 nM | 9.65–86.9 nM | ||||||
Urbanova et al., 2010 | Highly porous Bi film electrodes | 0.1 M acetate buffer (pH = 4.5) | DPASV | Cd(II) | 5.34 nM | 178–1160 nM | 90 s at −0.95 V | |
Pb(II) | 6.27 nM | 96.5–627 nM | ||||||
Zaouak et al., 2009 | Bi-Coated SPμE | 0.2 M acetate buffer (pH = 4.5) | SWASV | Cd(II) | 11.6 nM | 45–400 nM | 120 s at −1 V | |
Lu et al., 2010 | Bi doped carbon SPE | Air | SWASV | Pb(II) as vapor | 1 ng | 10–80 ng | 120 s at −1.2 V | |
CARBON ELECTRODE MATERIALS | ||||||||
DLC/GC | ||||||||
Feier et al., 2012 | Graphite felt | 0.1 M NaBF4 | LSASV | Zn(II) | 50 nM | 1–100 μM | 300 s at −1.4 V | |
Nasraoui et al., 2009 | Graphite felt | 0.1 M LiClO4 | LSASV | Pb(II) | 1 nM | 10–500 nM | 300 s at −1 V | |
Khadro et al., 2009 | GC electrode | 0.1 M HCl | DPASV | Ni(II) | 2.56 nM | 8.52–9370 nM | 60 s at −1 V | |
0.1 M acetic buffer | Hg(II) | 0.15 nM | 0.5–1740 nM | |||||
Khadro et al., 2011 | B-doped DLC | Acetate (pH = 4.2) | SWASV | Cd(II) | 4.83 nM | 4.83–121 nM | 90 s at −1.3 V | |
Pb(II) | 8.9 nM | 8.9–222 nM | ||||||
Ni(II) | 34.1 nM | 34.1–256 nM | ||||||
Hg(II) | 4.99 nM | 5–125 nM | ||||||
BDD | ||||||||
Le et al., 2012 | BDD | acetate pH = 5.2 | SWASV | Pb(II) | 19.3 nM | 96.5–480 nM | 600 s at −1 V | |
El Tall et al., 2007 | BDD | 0.01 M acetate | DPASV | Cu(II) | 14.2 nM | 47–315 nM | 60 s at −1.9 V | |
Pb(II) | 5.55 nM | 18–217 nM | ||||||
Zn(II) | 25.5 nM | 77–305 nM | ||||||
Cd(II) | 3.2 nM | 11–222 nM | ||||||
Sbartai et al., 2012 | BDD | Potassium citrate / HCl | DPASV | Cd(II) | 3.29 nM | NF | 20 s at −1.7 V | |
Pb(II) | 26.5 nM | |||||||
Ni(II) | 116 nM | |||||||
Hg(II) | 11.5 nM | |||||||
ISEs | ||||||||
CALIXARENE | ||||||||
Yaftian et al., 2006 | Calix[4]arene | Complex (pH = 3.5–5) | SCP | Pb(II) | 1.4 μM | 10μM–10 mM | No accumulation and electrolysis | |
Yaftian et al., 2007 | Calix[4]arene | Complex (pH = 3–7) | SCP | Pb(II) | 4 nM | 10 nM–100 μM | No accumulation and electrolysis | |
CHALCOGENIDE | ||||||||
Cali et al., 2002 | Cu-As-S | KNO3 | SCP | Cu(II) | 1 μM | 2 μM–10 mM | No accumulation and electrolysis | |
Essi and Pradel, 2011a,b | Cu-Ag-S | Complex (pH = 3–5) | SCP | Cu(II) | 1 μM | NC | No accumulation and electrolysis | |
Mear et al., 2005 | Ge28Se60Sb12 | KNO3 (pH = 3) | SCP | Cd(II) | 1 μM | 1 μM–10 mM | No accumulation and electrolysis | |
CMEs | ||||||||
MINERALS | ||||||||
Walcarius et al., 1999a | Silica modified CPE | 0.2 M HNO3 | SWASV | Cu(II) | 2 nM | 5 nM–5 μM | 600 s accumulation followed by 30 s at −0.5 V | |
Walcarius et al., 2000 | Silica-modified electrode | 0.1 M HNO3 | SWASV | Hg(II) | 50 nM | 200 nM–10 μM | 600 s accumulation at open circuit followed by 60 s at −0.5 V | |
Walcarius et al., 1999b | Several silica/hybrid CPE with amine functionalization | 0.05 M acetic acid + 0.05 M NaNO3 | LSASV | Cu(II) | NC | unclear | Several accumulation time and 240 s at −0.4 V | |
Etienne et al., 2001 | Organically modified silica | 0.1 M sodium acetate | SWASV | Cu(II) | 3 nM | 50–200 nM | 60 s at −0.5 V | |
Sayen et al., 2003 | Carnosine silica hybrid material modified CPE | 0.1 M NaNO3 + 0.01 M HNO3 | DPASV | Cu(II) | 4 nM | 50–1000 nM | 90 s at −0.5 V | |
Walcarius and Sibottier, 2005 | Amine-functionalized porous silica films on Au | 0.1 M HNO3 + 0.1 M NaNO3 in 95% ethanol | DPASV | Cu(II) | 40 nM | 0.1–10 μM | 600 s accumulation followed by 60 s at −0.4 V | |
Etienne et al., 2007 | Surfactant-templated thiol-functionalized silica thin films | 0.5 M HCl | DPASV | Ag(I) | 6 nM | 0.2–10 μM | 960 s accumulation followed by 60 s at −0.6 V | |
Sanchez and Walcarius, 2010 | GC/MTTZ | 0.1 M HCl | SWASV | Hg(II) | 2 nM | 50 nM–1 μM | 300 s at −0.4 V | |
Walcarius et al., 1998 | Mesoporous pure silica modified carbon paste electrode | 0.2 M HNO3 | SWASV (or CV for larger amounts) | Cu(II) | 30 nM | NC | 300 s accumulation followed by 60 s at −0.5 V | |
Hg(II) | 50 nM | NC | ||||||
Tonle et al., 2005 | Clays grafted with organic chelating groups (thiol or amine) modified CPE | 0.1 M HNO3 | DPASV | Hg(II) | 68 nM (thiol) 87 nM (amine) | 100–700 nM | 180 s accumulation followed by 60 s at −0.4 V (or −0.6 V depending on the medium) | |
Tonle et al., 2011 | Thiol-functionalized clay modified CPE | 0.2 M HNO3 | SWASV | Pb(II) | 60 nM | 0.3–10 μM | 600 s accumulation followed by 60 s at −0.9 V | |
Tchinda et al., 2007 | GC/PCH-SH | 0.1 M HCl + 5% thiourea | DPASV | Hg(II) | 0.4 nM | 4–20 nM and 50–80 nM | 1200 s accumulation followed by 180 s at −0.7 V | |
MACROCYCLIC COMPOUNDS | ||||||||
Rouis et al., 2013 | β-ketoimine calix[4]arene on ITO | 0.05 M ammonium acetate (pH = 7) | Impedance | Hg2+ | NC | 0.1 nM–0.5 μM | ||
Goubert-Renaudin et al., 2009a | Cyclam-functionalized silica CPE | 3 M HNO3 | SWASV | Cu(II) | 0.8 nM | 2–100 μM | 1800 s accumulation followed by 60 s at −0.5V | |
Goubert-Renaudin et al., 2009b | (TETAM) grafted to silica gel and ordered mesoporous silica | 0.1 M ammonium acetate buffer (pH = 7) | SWASV | Pb(II) | 2.7 nM | 10–100 nM | 900 s accumulation followed by 60 s at −0.8 V | |
Nasraoui et al., 2010a | TETRAM-modified graphite felt electrode | 0.1 M aqueous solution of LiClO4 | LSASV | Pb(II) | 25 nM | 100–250 nM | around 1800 s accumulation followed by 300 s at −1 V | |
Nasraoui et al., 2010b | Cyclam-modified graphite felt | 0.5 M H2SO4 | LSASV | Pb(II) | 25 nM | several accumulation time followed by 300 s at −1 V | ||
Parat et al., 2006 | Hg film modified SPE | 0.1 M KNO3 | LSASV | Cd(II) | 6 nM | NC | 120 s at −1 V | |
Pb(II) | 8 nM | |||||||
Betelu et al., 2007 | Hg film + membrane modified SPE | 0.01 M NaHCO3 | LSASV | Cd(II) | NC | NC | 120 s at −1 V | |
Pb(II) | ||||||||
POLYMERS | ||||||||
Heitzmann et al., 2007 | Poly(pyrrole-EDTA like) film | 0.1 M buffer (pH = 5) | SWASV | Cd(II), Pb(II) and Cu(II) | NC | NC | 600 s accumulation followed by 40 s at −1.2 V for Pb(II) and −0.9 V for Cu(II) | |
Hg(II) | 0.5 nM | NC | ||||||
Buica et al., 2009a | Poly(EDTA-like) Film | 0.1 M acetate buffer (pH = 4.5) | DPASV | Cu(II) | 600 s accumulation followed by 60 s at −0.4 V | |||
Buica et al., 2009b | Poly(pyrrole-EDTA) modified electrode | 0.1 M acetate buffer (pH = 4.5) | DPASV | Hg(II) | 10 nM (imprinted polymers) | 10–1000 nM (imprinted polymers) | 600 s accumulation followed by 180 s at −1.8 V | |
Pb(II) | 0.5 nM | 10–1000 nM | 600 s accumulation followed by 40 s at −0.9 V | |||||
Cu(II) | 5 nM | 25–250 nM | ||||||
Heitzmann et al., 2005 | Poly(pyrrole-malonic acid) film modified carbon electrode | 0.2 M acetate buffer (pH = 4.4) | SWASV | Hg(II) | 50 nM | NC | ||
Cd(II) | 0.2 μM | 1–10 μM | 600 s accumulation followed by 40 s at −1.1 V | |||||
Pereira et al., 2011 | Complexing polymer films | 0.1 M acetate buffer (pH = 4.4) | SWASV | Pb(II) | 0.5 nM | 10–1000 nM | 600 s accumulation followed by 40 s at −0.9 V or −1.1 V for Cd(II) | |
Cu(II) | 5 nM | 25–250 nM | ||||||
Hg(II) | 100 nM | 100–1000 nM | ||||||
Cd(II) | 500 nM | 100–10000 nM | ||||||
Rivas et al., 2006 | Complexing polymer films | 0.1 M acetate buffer (pH = 4.8) | SWASV | Pb(II) | NC | 0.01–5 mM | 600 s accumulation followed by 40 s at −0.6 V | |
Bessbousse et al., 2011 | Nanoporous β-PVDF membrane electrode | 0.1 M sodium acetate | SWASV | Pb(II) | 0.63 nM | NC | 30 min equilibrium followed by 100 s at −0.8 V | |
Zejli et al., 2007 | Polythiophene film | 0.2 M KNO3 (pH = 5) | DPASV | Ag(I) | 0.56 μM | 0.65–9.3 μM | 120 s at −0.5 V | |
Yasri et al., 2011 | GC/PEDOT:PSS | HCl (pH = 2.2) | CA | Pb(II) | 0.19 nM | 2–100 nM | 30 s at −0.65 V | |
NPs | ||||||||
Ottakam Thotiyl et al., 2012 | Au/MPS-(PDDA-AuNPs) | Phosphate buffer (pH = 8) | DPASV | As(III) | 0.48 μM | NC | ||
Hezard et al., 2012a | GC + AuNPs | 0.01 M HCl | SWASV | Hg(II) | 0.42 nM | 0.64–4 nM | 300 s at 0 V | |
Hezard et al., 2012b | GC + AuNPs | 0.01M HCl | SWASV | Hg(II) | 0.4 nM | 0.8–9.9 nM | 300 s at 0 V | |
BIOSENSORS | ||||||||
Chouteau et al., 2004 | Alkaline phosphatase | 10 mM Tris-HCl buffer (pH = 8.5) / 1 mM MgCl2 | Conductometry | Cd2+ | 8.9 nM | NC | ||
Chouteau et al., 2005 | Alkaline phosphatase Acetylcholinesterase | 10 mM Tris-HCl buffer (pH = 8.5) / 1 mM MgCl2 | Conductometry | Cd2+ | 89 nM | NC | 30 min incubation | |
Zn2+ | 0.15 μM | |||||||
Tekaya et al., 2013 | Alkaline phosphatase | 5 mM HEPES buffer (pH = 8.1) | Conductometry | Cd2+ | 10−20 M | NC | 24 h incubation | |
Hg2+ | ||||||||
Soldatkin et al., 2012 | Invertase, mutarotase, glucose oxidase | 5 mM phosphate buffer (pH = 6.5) | Conductometry | Hg2+ | 25 nM | NC | 20 min incubation | |
Ag+ | 100 nM | |||||||
Mohammadi et al., 2005 | Invertase, mutarotase, glucose oxidase | 0.1 M phosphate buffer (pH = 6) | Amperometry | Hg(II) | NC | 10 nM–1 μM | 20 min incubation at pH = 4 | |
Gayet et al., 1993 | L-lactate dehydrogenase L-lactate oxidase | 0.1 M Tris buffer (pH = 9) | Amperometry | Hg(II) | 1 μM | NC | 5 min incubation | |
Ag+ | 0.1 μM | |||||||
Cd2+ | 10 μM | |||||||
Zn2+ | 10 μM | |||||||
Pb2+ | 50 μM | |||||||
Cu2+ | 250 μM |
*All parameters given are the ones for the best LODs.