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. 2014 Jun 13;9(1):301. doi: 10.1186/1556-276X-9-301

Table 3.

Thickness evolution of the thin films obtained LbL-E deposition technique

Fabrication process	Thickness (nm)	LSPR (λ_max; A_max)
[PAH(9.0)/PAA-AgNPs(9.0)]₁₀	63 ± 5	421.3 nm; 0.017
[PAH(9.0)/PAA-AgNPs(9.0)]₂₀	165 ± 4	432.1 nm; 0.13
[PAH(9.0)/PAA-AgNPs(9.0)]₃₀	507 ± 16	432.3 nm; 0.77
[PAH(9.0)/PAA-AgNPs(9.0)]₄₀	642 ± 12	432.6 nm; 1.18

Thickness evolution of the LbL-E thin films and the location of the LSPR absorption bands (λ_max) with their maxima absorbance values (A_max).