Skip to main content
. 2014 Jun 13;9(1):301. doi: 10.1186/1556-276X-9-301

Table 4.

Thickness evolution of the thin films obtained LbL-E deposition technique after thermal treatment

Fabrication process Temperature Thickness (nm) LSPR (λmax; Amax)
[PAH(9.0)/PAA-AgNPs(9.0)]40
 Ambient
 642 ± 12
 432.6 nm; 1.18
[PAH(9.0)/PAA-AgNPs(9.0)]40
 50°C
 611 ± 16
 432.6 nm; 1.20
[PAH(9.0)/PAA-AgNPs(9.0)]40
 100°C
 600 ± 12
 432.6 nm; 1.26
[PAH(9.0)/PAA-AgNPs(9.0)]40
 150°C
 552 ± 9
 432.6 nm; 1.68
[PAH(9.0)/PAA-AgNPs(9.0)]40 200°C 452 ± 10 446.9 nm; 1.66

Thickness evolution of the LbL-E thin films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax) as a function of the temperature.