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. 2014 Jul 26;9(1):366. doi: 10.1186/1556-276X-9-366

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Copyright © 2014 Maikap et al.; licensee Springer.

This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.

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Schematic view of via-hole device and OM image. (a) Schematic view of the Cu pillar formation and memory characteristics of an Al/Cu/Al₂O₃/TiN structure. (b) Optical image (OM) of a typical 4 × 4 μm² device. The ‘V4.0’ as indicated on OM image is via size of 4 × 4 μm².