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. 2014 Jul 15;6(15):11834–11838. doi: 10.1021/am5032105

Figure 1.

Figure 1

AFM images of the ALD-Al2O3 layer deposited using (a) TMA/H2O at 200 °C (30 cycles), (b) TMA/O3 (30 cycles) at 200 °C, and (c) TMA/O3 (5 cycles of seeding layer at 30 °C, followed by 45 cycles of ALD at 200 °C).